Model Surfaces Produced by Atomic Layer Deposition

Atomic Layer Deposition of Platinum on Strontium Titanate Surfaces

Atomic Layer Deposition of Platinum on Strontium Titanate Surfaces Tremendous energy savings and environmental benefits are possible from improved catalysts for chemical manufacturing and emissions reduction. Breakthroughs in catalyst development will be enabled by precise methods for synthesizing nanostructured materials. Atomic layer deposition (ALD) is a thin film growth technique that is cu...

Nucleation Studies of HfO2 Thin Films Produced by Atomic Layer Deposition

A hot wall Atomic Layer Deposition (ALD) flow reactor equipped with a Quartz Crystal Microbalance (QCM) has been used for the deposition of HfO2 thin films with tetrakis (dimethylamino) hafnium (TDMAH) and H2O as precursors. HfO2 films were deposited on Hterminated Si and SC1 chemical oxide starting surfaces. Spectroscopic ellipsometry (SE) and QCM measurements confirm linear growth of the film...

Atomic layer deposition: an overview.

Atomic Layer Deposition of TiO

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Atomic Layer Deposition of Model Metal Oxide Electrode Architectures

A thorough knowledge of chemical and electrochemical processes that occur at the electrode interface is paramount to the development of improved materials for electrochemical energy storage. One approach is to study model systems with well-defined structures and geometries (architectures) more amenable to systematic and careful study of such materials. The goal of this work is to develop new ap...